Abstract
Using numerical optimization algorithm, non-periodic Mo/Si, Mo/Be, and Ni/C broad angular multilayer analyzers have been designed. At the wavelength of 13 nm and the angular range of 45 similar to 49 degrees, the Mo/Si and Mo/Be multilayer can provide the plateau s-reflectivity of 65% and 45%, respectively. At 5.7 nm, the s-reflectivity of Ni/C multilayer is 16% in the 44 similar to 46 degrees range. The non-periodic Mo/Si broad angular multilayer was also fabricated using DC magnetron sputtering, and characterized using the soft X-ray polarimeter at BESSY. The s-reflectivity is higher than 45.6% over the angular range of 45 similar to 49 degrees at 13 nm, where, the degree of polarization is more than 99.98%. (c) 2006 Optical Society of American
Original language | English |
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Pages (from-to) | 2533 - 2538 |
Number of pages | 6 |
Journal | OPTICS EXPRESS |
Volume | 14 |
Issue number | 6 |
DOIs | |
Publication status | Published - Mar 2006 |