Determination of the evolution of layer thickness errors and interfacial imperfections in ultrathin sputtered Cr/C multilayers using high-resolution transmission electron microscopy

Hui Jiang, Alan Michette, Slawka Pfauntsch, Zhanshan Wang, Jingtao Zhu, Dehui Li

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

The structures of ultrathin sputtered Cr/C multilayers were determined by high-resolution transmission electron microscopy. The evolution of layer thickness errors, interdiffusion and interfacial roughness were simulated using time series models. The results show that with increasing of interdiffusion and roughness the multilayer thickness ratio changes, thereby influencing the optical performance. All structural parameters show good correlation with and influence adjacent layers. The system errors of the deposition equipment can also be evaluated by the models. (C) 2011 Optical Society of America
Original languageEnglish
Pages (from-to)11815 - 11824
Number of pages10
JournalOPTICS EXPRESS
Volume19
Issue number12
Publication statusPublished - 6 Jun 2011

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