Fabrication of PPF Electrodes by a Rapid Thermal Process

F. Javier del Campo; Philippe Godignon; Leigh Aldous; Esther Pausas; Monica Sarrion; Miguel Zabala; Ricard Prehn; Richard G. Compton

doi:10.1149/1.3515169

Fabrication of PPF Electrodes by a Rapid Thermal Process

F. Javier del Campo, Philippe Godignon, Leigh Aldous, Esther Pausas, Monica Sarrion, Miguel Zabala, Ricard Prehn, Richard G. Compton

Chemistry

Research output: Contribution to journal › Article › peer-review

23 Citations (Scopus)

Abstract

his work describes the fabrication of pyrolyzed photoresist films (PPFs) using a rapid thermal process for the first time. A standard positive phenolic photoresist was deposited over a silicon wafer and heated in an inert atmosphere at rates in excess of 140°C∕min140°C∕min up to a temperature of 1000°C1000°C . An annealing step of 1h1h at that temperature was required to obtain a more complete graphitization of the resist and thus improve its electrochemical response. The PPF synthesized by this rapid thermal process showed one of the lowest resistivities reported to date for this kind of material (ca. 4–6×10−3Ωcm4–6×10−3Ωcm ) but was slightly rougher than the PPF synthesized using slower thermal ramps (1.6 vs 0.5nm0.5nm ). This rapid thermal process allows the fabrication, by direct lithoghraphy, of structures down to 50μm50μm in width. The electrochemical behavior of our PPF closely resembled glassy carbon, as shown by the voltammetry of Fe(CN)4−∕3−6Fe(CN)64−∕3− , Ru(NH3)3+∕2+6Ru(NH3)63+∕2+ , Fe3+∕2+Fe3+∕2+ , and dopamine.

Original language	English
Pages (from-to)	H63-H68
Journal	Journal of the Electrochemical Society
Volume	158
Issue number	1
DOIs	https://doi.org/10.1149/1.3515169
Publication status	Published - 2011

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title = "Fabrication of PPF Electrodes by a Rapid Thermal Process",

abstract = "his work describes the fabrication of pyrolyzed photoresist films (PPFs) using a rapid thermal process for the first time. A standard positive phenolic photoresist was deposited over a silicon wafer and heated in an inert atmosphere at rates in excess of 140°C∕min140°C∕min up to a temperature of 1000°C1000°C . An annealing step of 1h1h at that temperature was required to obtain a more complete graphitization of the resist and thus improve its electrochemical response. The PPF synthesized by this rapid thermal process showed one of the lowest resistivities reported to date for this kind of material (ca. 4–6×10−3Ωcm4–6×10−3Ωcm ) but was slightly rougher than the PPF synthesized using slower thermal ramps (1.6 vs 0.5nm0.5nm ). This rapid thermal process allows the fabrication, by direct lithoghraphy, of structures down to 50μm50μm in width. The electrochemical behavior of our PPF closely resembled glassy carbon, as shown by the voltammetry of Fe(CN)4−∕3−6Fe(CN)64−∕3− , Ru(NH3)3+∕2+6Ru(NH3)63+∕2+ , Fe3+∕2+Fe3+∕2+ , and dopamine.",

author = "{Javier del Campo}, F. and Philippe Godignon and Leigh Aldous and Esther Pausas and Monica Sarrion and Miguel Zabala and Ricard Prehn and Compton, {Richard G.}",

year = "2011",

doi = "10.1149/1.3515169",

language = "English",

volume = "158",

pages = "H63--H68",

journal = "Journal of the Electrochemical Society",

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TY - JOUR

T1 - Fabrication of PPF Electrodes by a Rapid Thermal Process

AU - Javier del Campo, F.

AU - Godignon, Philippe

AU - Aldous, Leigh

AU - Pausas, Esther

AU - Sarrion, Monica

AU - Zabala, Miguel

AU - Prehn, Ricard

AU - Compton, Richard G.

PY - 2011

Y1 - 2011

N2 - his work describes the fabrication of pyrolyzed photoresist films (PPFs) using a rapid thermal process for the first time. A standard positive phenolic photoresist was deposited over a silicon wafer and heated in an inert atmosphere at rates in excess of 140°C∕min140°C∕min up to a temperature of 1000°C1000°C . An annealing step of 1h1h at that temperature was required to obtain a more complete graphitization of the resist and thus improve its electrochemical response. The PPF synthesized by this rapid thermal process showed one of the lowest resistivities reported to date for this kind of material (ca. 4–6×10−3Ωcm4–6×10−3Ωcm ) but was slightly rougher than the PPF synthesized using slower thermal ramps (1.6 vs 0.5nm0.5nm ). This rapid thermal process allows the fabrication, by direct lithoghraphy, of structures down to 50μm50μm in width. The electrochemical behavior of our PPF closely resembled glassy carbon, as shown by the voltammetry of Fe(CN)4−∕3−6Fe(CN)64−∕3− , Ru(NH3)3+∕2+6Ru(NH3)63+∕2+ , Fe3+∕2+Fe3+∕2+ , and dopamine.

AB - his work describes the fabrication of pyrolyzed photoresist films (PPFs) using a rapid thermal process for the first time. A standard positive phenolic photoresist was deposited over a silicon wafer and heated in an inert atmosphere at rates in excess of 140°C∕min140°C∕min up to a temperature of 1000°C1000°C . An annealing step of 1h1h at that temperature was required to obtain a more complete graphitization of the resist and thus improve its electrochemical response. The PPF synthesized by this rapid thermal process showed one of the lowest resistivities reported to date for this kind of material (ca. 4–6×10−3Ωcm4–6×10−3Ωcm ) but was slightly rougher than the PPF synthesized using slower thermal ramps (1.6 vs 0.5nm0.5nm ). This rapid thermal process allows the fabrication, by direct lithoghraphy, of structures down to 50μm50μm in width. The electrochemical behavior of our PPF closely resembled glassy carbon, as shown by the voltammetry of Fe(CN)4−∕3−6Fe(CN)64−∕3− , Ru(NH3)3+∕2+6Ru(NH3)63+∕2+ , Fe3+∕2+Fe3+∕2+ , and dopamine.

U2 - 10.1149/1.3515169

DO - 10.1149/1.3515169

M3 - Article

SN - 0013-4651

VL - 158

SP - H63-H68

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

IS - 1

ER -

Fabrication of PPF Electrodes by a Rapid Thermal Process

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