TY - JOUR
T1 - In situ electrochemical-X-ray Photoelectron Spectroscopy: Rubidium metal deposition from an ionic liquid in competition with solvent breakdown
AU - Wibowo, Rahmat
AU - Aldous, Leigh
AU - Jacobs, Robert M. J.
AU - Manan, Ninie S. A.
AU - Compton, Richard G.
PY - 2011/11/28
Y1 - 2011/11/28
N2 - The electrodeposition of rubidium from an ionic liquid (IL) N-butyl-N-methylpyrrolidium bis(trifluoromethylsulfonyl)imide ([C4mpyrr][NTf2]) has been performed and monitored at a Nickel mesh electrode by using in situ electrochemical-X-ray Photoelectron Spectroscopy (XPS) measurements. At extremely high current values during the deposition of the metal, the solvent breakdown was also observed. By choosing suitable low current values, electrodeposition of Rb can be promoted over the IL degradation. IL degradation was characterised by carbonisation of the electrode-IL-vacuum interface, with the loss of fluorine being relatively pronounced, consistent with reduction of the [NTf2]− anion.
AB - The electrodeposition of rubidium from an ionic liquid (IL) N-butyl-N-methylpyrrolidium bis(trifluoromethylsulfonyl)imide ([C4mpyrr][NTf2]) has been performed and monitored at a Nickel mesh electrode by using in situ electrochemical-X-ray Photoelectron Spectroscopy (XPS) measurements. At extremely high current values during the deposition of the metal, the solvent breakdown was also observed. By choosing suitable low current values, electrodeposition of Rb can be promoted over the IL degradation. IL degradation was characterised by carbonisation of the electrode-IL-vacuum interface, with the loss of fluorine being relatively pronounced, consistent with reduction of the [NTf2]− anion.
U2 - 10.1016/j.cplett.2011.10.017
DO - 10.1016/j.cplett.2011.10.017
M3 - Article
SN - 0009-2614
VL - 517
SP - 103
EP - 107
JO - CHEMICAL PHYSICS LETTERS
JF - CHEMICAL PHYSICS LETTERS
IS - 1-3
ER -