Scrubbing Effect of Self-etching Adhesives on Bond Strength to NaOCl-treated Dentin

Taweesak Prasansuttiporn*, Masatoshi Nakajima, Richard M. Foxton, Junji Tagami

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Purpose: To evaluate the scrubbing effect of self-etching adhesive systems on the microtensile bond strengths to sodium hypochlorite-treated dentin.

Materials and Methods: The occlusal surfaces of 36 extracted human third molars were horizontally cut to expose sound dentin. The dentin surfaces of the teeth were treated with 6% NaOCl aqueous solution for 30 s or none. After water rinsing for 10 s and air drying, a 2-step (Clearfil Protect Bond) or 1-step (Clearfil S-3 Bond or Bond Force) self-etching adhesive was applied with or without a scrubbing technique, and resin composite (Clearfil AP-X) crowns were built up. The bonded specimens were stored in water for 24 h and then subjected to the microtensile bond test at a crosshead speed of 1.0 mm/min. Data were analyzed using three-way ANOVA and Bonferroni multiple comparisons (p <0.05).

Results: The NaOCl-treated dentin exhibited significantly lower bond strength with the tested self-etching adhesive systems than did the normal dentin (p <0.05). Using a scrubbing technique for the tested self-etching adhesive systems significantly improved the mu TBS to NaOCl-treated dentin (p <0.05), whereas there was no significant difference in mu TBS to normal dentin between a scrubbing and nonscrubbing technique (p > 0.05).

Conclusion: Using a scrubbing technique for applying self-etching adhesive systems to NaOCl-treated dentin was effective in improving the compromised bonding.

Original languageEnglish
Pages (from-to)121-127
Number of pages7
JournalJOURNAL OF ADHESIVE DENTISTRY
Volume14
Issue number2
DOIs
Publication statusPublished - Apr 2012

Keywords

  • sodium hypochlorite
  • scrubbing
  • dentin
  • bond strength
  • adhesives
  • SODIUM-HYPOCHLORITE TREATMENT
  • PRIMER
  • ENAMEL

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